NIST Technicalendar June 25 to June 29, 2007 The NIST Technicalendar is issued each Friday. All items MUST be submitted electronically from this web page by 12:00 NOON each Wednesday unless otherwise stated in the NIST Technicalendar. The address for online weekly editions of the NIST Technicalendar and NIST Administrative Calendar is: http://www.nist.gov/tcal/.
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In this Issue: Meetings at NIST Meetings Elsewhere Announcements Talks by NIST Personnel NIST Web Site Announcements NIST Administrative Calendar (current)   NIST Vacancy Announcements (current)

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9:00 AM - IEEE Magnetism in Nanotechnology & Electronics Conference
10:30 AM - Spatial resolution limits of electron beam nanopattering

No Scheduled Events

12:00 PM - NCW Brown Bag Picnic area
2:30 PM - MEMS Spatial Light Modulators

9:00 AM - LabVIEW User's Group Meeting
3:00 PM - On the Use of Fully Three Dimensional Multifield Mixed Finite Element Scheme in Multiscale Structural and Building Energy Efficiency Simulations
3:30 PM - Investigating the Paranormal: Lessons in Critical Thinking

No Scheduled Events

6/25 -- MONDAY

9:00 AM - METALLURGY DIVISION SEMINAR: IEEE Magnetism in Nanotechnology & Electronics Conference
The IEEE Magnetics Society Chapter of the Northern Virginia/Washington DC is organizing the IMAGINE Conference 2007 to provide an occasion for the magnetism researchers in this region and nearby to meet, interact, and exchange ideas. In addition, this is a good opportunity for postdoc/junior researchers and graduate students to present their research and gain exposure in the magnetism community.
IEEE IMAGINE , CONFERENCE.
Administration Bldg, Red Auditorium. (NIST Contact: Wing Tat Pong, 301-975-8876, ppong@nist.gov) http://ewh.ieee.org/r2/wash_nova/mags/ieeeimagine/

10:30 AM - CENTER FOR NANOSCALE SCIENCE AND TECHNOLOGY SEMINAR: Spatial resolution limits of electron beam nanopattering
Electron beam lithography has represented the most effective way to pattern materials at the nanoscale for almost four decades. The success of e-beam lithography depends on multiple factors such as electron optics, the interaction between the beam of electrons and the pattern material (resist), and the interaction between the developer and the exposed resist. At the Center for Nanoscale Materials at Argonne we use a Raith 150 ebeam tool that operates at 30 KV and a JEOL 9300 ebeam tool that operates at 100KV. We will discuss the spatial resolution achievable with electron beam lithography by cold [1] and hot development [2, 3]. Our results show improved resolution and contrast for resists that are exposed by polymer chain scission. Others results [2, 3] show that similar effect happens with crosslinked resist in opposite manner. Both share the common dissolution mechanism of molecular weight based dissolution. These results have impact in the photomask industry and other manufacturers that require squeezing out as much resolution out of their existing tools and materials. It is found that, even with the improvement by cold or hot development, there is a “shot noise” of 2% uncertainty limit that is not surpassed for resists exposed at 100 kV. This explains why high throughput and high resolution electron-beam nanolithography is not possible. References 1. L. E. Ocola, J. Vac. Sci. Technol, B 24, 3061 (2006) 2. M. Häffner, A. Haug, A. Heeren, M. Fleischer, H. Peisert, T. Chassé, D. P. Kern, EIPBN 2007 proceedings, to be published. 3. S. S. Choi Choi, N. Jin, V. Kumar, M. Shannon, and I. , N. Jin, V. Kumar, M. Shannon, and I. Adesida, EIPBN 2007 proceedings, to be published.
Leonidas Ocola , Center for Nanomaterials, Argonne National Laboratory , Argonne, IL.
Bldg. 217, Rm. H107. (NIST Contact: J. Alexander Liddle, 301-975-6050, alex.liddle@nist.gov)


6/26 -- TUESDAY

No Scheduled Events

6/27 -- WEDNESDAY

12:00 PM - OFFICE OF THE DIRECTOR, NIST SEMINAR: NCW Brown Bag Picnic area
. . , ..
Picnic Area Bldg, Rm. Picnic Area. (NIST Contact: Suzie Price, 301-975-3827, suzie.price@nist.gov)

2:30 PM - CENTER FOR NANOSCALE SCIENCE AND TECHNOLOGY SEMINAR: MEMS Spatial Light Modulators
Micro Electro Mechanical Systems (MEMS) technology enables mass production of microscopic mechanical systems containing millions of individual elements through batch fabrication techniques. High speed, excellent optical quality and dense integration of individually controlled micromechanical devices onto a single silicon chip allows an unprecedented degree of manipulation of the optical field by MEMS Spatial Light Modulators (SLMs) for applications in projection, adaptive optics, spectroscopy, and telecommunications. Recent advances reveal potential to bring revolutionary new capabilities in ophthalmology, optical sensing, imaging and metrology, information processing, free space communications, microscopic manipulation and quantum computing.
Dr. Vladimir Aksyuk , Bell Labs .
Bldg. 217, Rm. H107. (NIST Contact: J. Alexander Liddle, 301-975-6050, james.liddle@nist.gov)


6/28 -- THURSDAY

9:00 AM - CUSTOMER ACCESS AND SUPPORT DIVISION SEMINAR: LabVIEW User's Group Meeting
This is where we have technical discussions about LabVIEW Programming at NIST. We usually have a few volunteer speakers from NIST present some code that they have developed for an application that they are using. It is a great opportunity to learn a few things from the community. If you plan on attending, send an email to johnq@nist.gov.
Alan Loprete , National Instruments Field Engineer.
Administration Bldg, Lecture Rm. F. (NIST Contact: John Quintavalle, 301-975-2297, johnq@nist.gov)

3:00 PM - MATHEMATICAL AND COMPUTATIONAL SCIENCES DIVISION SEMINAR: On the Use of Fully Three Dimensional Multifield Mixed Finite Element Scheme in Multiscale Structural and Building Energy Efficiency Simulations
Dubravka Mijuca , University of Belgrade, Serbia.
Administration Bldg, Lecture Rm. A. (NIST Contact: Geoffrey McFadden, 301-975-2711, geoffrey.mcfadden@nist.gov) http://math.nist.gov/mcsd/Seminars/2007/2007-06-28-mijuca.html

3:30 PM - SURF SUMMER SEMINAR SERIES: Investigating the Paranormal: Lessons in Critical Thinking
Joe Nickell, Ph.D. -- a former stage magician and private detective, and now perhaps the world's only full-time professional paranormal investigator -- explores the fringes of science. In this wide-ranging, slide-illustrated presentation, he looks at hauntings, alien visitations, the ancient Nasca lines, cases of "spontaneous human combustion," and other examples of the world's strangest mysteries. Nickell argues that such "Real-Life X-Files" (the title of one of his many books) should neither be fostered nor dismissed out of hand. Rather, they should be carefully investigated using the same principles that would apply to a murder mystery.
Dr. Joe Nickell , Center for Inquiry, Amherst, NY.
Administration Bldg, Red Auditorium. (NIST Contact: Anita Sweigert, 301-975-4201, anita.sweigert@nist.gov)
Special Assistance; Contact A. Sweigert a week in advance.


6/29 -- FRIDAY

No Scheduled Events

ADVANCE NOTICE

No Scheduled Events

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MEETINGS ELSEWHERE


6/25 -- MONDAY

No Scheduled Events

6/26 -- TUESDAY

No Scheduled Events

6/27 -- WEDNESDAY

No Scheduled Events

6/28 -- THURSDAY

No Scheduled Events

6/29 -- FRIDAY

No Scheduled Events

ADVANCE NOTICE

No Scheduled Events

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TALKS BY NIST PERSONNEL

CURRY, J. (Co-Author: B.Lafitte , NIST) : QUANTITATIVE X-RAY IMAGING OF DENSITY DISTRIBUTIONS IN HIGH-INTENSITY DISCHARGE LAMPS .
IEEE International Conference on Plasma Science, Albuquerque, New Mexico, 6/18.

POTRA, F. : INTERIOR POINT METHODS: A REVOLUTION IN OPTIMIZATION.
University of Perugia, Perugia, Italy, 6/23.

OKERBERG, B. : SEMICRYSTALLINE POLYMERS PATTERNED BY NANOIMPRINT LITHOGRAPHY.
Gordon Research Conference, South Hadley, MA, 6/25.

RUST, B. : DATA-BASED MODELS FOR GLOBAL TEMPERATURE VARIATIONS.
WORLDCOMP '07 Conference, Las Vegas, NV, 6/26.

YOUSSEF, A. : METHODS OF RELEVANCE RANKING AND HIT-CONTENT GENERATION IN MATH SEARCH.
6th International Conference on Mathematical Knowledge Management (MKM), Linz, Austria, 6/28.

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ANNOUNCEMENTS

POSTDOC CONFERENCE AND CAREER EXPO - ACCESS TO STEM TALENT
Are you a postdoctoral fellow working in a D.C. area lab, hoping to find a permanent position with a federal organization or private company? Want to avoid the hassle of moving across the country to start your career? Then do not miss the Second Annual Post-doc Conference: Access to STEM (Science, Technology, Engineering and Mathematics) Talent. This symposium will introduce young Ph.D. researchers to career opportunities in industry, government agencies, nonprofits, and entrepreneurial opportunities in the greater D.C. area. The symposium will include lunch and a job fair with local companies looking for Ph.D. talent. Last year the conference sold out! Register soon to guarantee your spot! Registration will close promptly at 5:00 p.m. on Wednesday, June 20, 2007. You must register by this time and there will be no walk-ins allowed to the conference. You are required to submit a copy of your resume to register. Post-doc Conference: Access to STEM Talent Wednesday, 27 June 2007 8:00 a.m. - 4:00 p.m. National Institute of Standards & Technology (NIST) 100 Bureau Drive Gaithersburg, MD For more information and to pre-register, go to https://techcouncilmd.com/events/detail.php?list=Events&laction=detail.php&evt_id=4
NIST Contact: Susan Heller-Zeisler, 301-975-3111, szeisler@nist.gov

VISITOR REGISTRATION FOR NIST EVENTS
Because of heightened security at the NIST Gaithersburg site, members of the public who wish to attend meetings, seminars, lectures, etc. must first register in advance. For more information please call or e-mail the "NIST Contact" for the particular event you would like to attend.
NIST Contact: . ., ., .

2007 WORLD STANDARDS DAY PAPER COMPETITION
The U.S. standards community will celebrate World Standards Day on Thursday, October 18, 2007, at the Ronald Reagan Building and International Trade Center in Washington, DC. This year’s theme, “Standards and the Global Village” recognizes the global consensus-building capacity of standards developing organizations. Along with this event, the 2007 World Standards Day sponsors, including NIST, will hold the annual paper competition. Papers are invited that show, using specific examples, ways that standards developing organizations have encouraged and created global consensus for the economic and social benefit of the global village. Paper competition winners will be announced and given their awards at the U.S. celebration of World Standards Day. Cash prizes are awarded by the Standards Engineering Society (SES) and the World Standards Day Planning Committee. The first place winner will receive a plaque and $2,500. Second and third place winners will receive $1,000 and $500, respectively, along with a certificate. In addition, the winning papers will be published in SES’s journal, Standards Engineering. ELIGIBILITY: The competition is open to all U.S. individuals in the private sector or at government facilities. Papers may be co-authored. RULES: Entries must be original and not previously published. NIST papers must be processed through WERB or BERB. All paper contest submissions must be received with an official entry form by midnight August 31, 2007, by the SES Executive Director, 13340 SW 96th Avenue, Miami, Florida, 33176. Complete details and entry forms are available on the SES website www.ses-standards.org (follow the link for “2007 WSD Paper Competition.”) For additional information about the U.S. Celebration of World Standards Day, or to register for the event, please visit www.wsd-us.org.
NIST Contact: Mary Donaldson, 301-975-6197, mary.donaldson@nist.gov

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NIST WEB SITE ANNOUNCEMENTS

No Web Site announcements this week.

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For more information, contact Ms. Sharon Hallman, Editor, Stop 2500, National Institute of Standards and Technology, Gaithersburg MD 20899-2500; Telephone: 301-975-TCAL (3570); Fax: 301-926-4431; or Email: tcal@nist.gov.

All lectures and meetings are open unless otherwise stated.

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